Optical properties of Si nanocomposite films prepared by laser ablation

被引：9

作者：

Kaganovich, EB ^{[1
]}

Kudryavtsev, AA ^{[1
]}

Manoilov, EG ^{[1
]}

Svechnikov, SV ^{[1
]}

Indutnyi, IZ ^{[1
]}

机构：

[1] Natl Acad Sci Ukraine, Inst Semicond Phys, UA-252028 Kiev, Ukraine

来源：

THIN SOLID FILMS | 1999年 / 349卷 / 1-2期

关键词：

laser ablation; nanostructures; optical properties; silicon;

D O I：

10.1016/S0040-6090(99)00218-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Optical properties of thin films obtained by reactive pulse laser ablation of monocrystalline Si in He, O-2 or N-2 atmosphere have been studied. Both transmissivity and reflectivity of these films were measured in the range of 200-1200 nm and used for a calculation of their optical constants. The analysis of optical spectra has led to conclusion that the films prepared in this manner are composite structures containing at least two phases: the SiOxNy matrix and Si nanocrystallites embedded in it. We have shown good correlation between dependences of visible PL intensity and Si nanocrystallite sizes on preparation conditions. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：298 / 302

页数：5

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