Electron-beam lithography of multiple-layer submicrometer periodic arrays on a barium fluoride substrate

被引：3

作者：

Tharp, J. S. ^{[1
]}

Shelton, D. J. ^{[1
]}

Wadsworth, S. L. ^{[1
]}

Boreman, G. D. ^{[1
]}

机构：

[1] Univ Cent Florida, CREOL, Coll Opt & Photon, Orlando, FL 32817 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2008年 / 26卷 / 05期

关键词：

D O I：

10.1116/1.2966431

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We explored fabrication-process options for use of BaF2 when used in direct-write electron-beam lithography. This material is of interest for IR FSS applications because of its low refractive index and high IR transparency. Challenges in the use of this material include its low conductivity, low reflectivity, attack by solvents, and sensitivity to thermal shock. Single- and double-layer submicrometer FSS structures were demonstrated on a BaF2 substrate. © 2008 American Vacuum Society.

引用

页码：1821 / 1823

页数：3

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