Impact ionization model for full band Monte Carlo simulation in GaAs

被引:77
作者
Jung, HK
Taniguchi, K
Hamaguchi, C
机构
[1] Department of Electronic Engineering, Osaka University, Yamada-oka, Suita
[2] Department of Electronic Engineering, Kunsan National University, Kunsan, Chonbuk
关键词
D O I
10.1063/1.361176
中图分类号
O59 [应用物理学];
学科分类号
摘要
The impact ionization rate in GaAs is derived from a first principle's calculation which includes realistic band structure and a wave-vector- and frequency-dependent dielectric function. The impact ionization rate is highly anisotropic at low electron energy, while it becomes isotropic at higher energy range in which impact ionization events frequently occur. The calculated impact ionization rate is well fitted to a modified Keldysh formula with two sets of power exponents of 7.8 and 5.6, indicating very soft threshold characteristics. Using a full band Monte Carlo simulation which includes the empirical phonon scattering rate based on first principles theory, we derived the impact ionization coefficient. The calculated impact ionization coefficients agree well with available experimental data. Our isotropic model shows better agreement with reported experimental data than a previous anisotropic model, especially in low electric field. The mean energy of secondary generated electrons is found to be expressed as two sets of linear functions of the primary electron energy. (C) 1996 American Institute of Physics.
引用
收藏
页码:2473 / 2480
页数:8
相关论文
共 46 条
[1]   ORIENTATION DEPENDENCE OF NORMAL-TYPE GAAS INTRINSIC AVALANCHE RESPONSE-TIME [J].
BERENZ, JJ ;
KINOSHITA, J ;
HIERL, TL ;
LEE, CA .
ELECTRONICS LETTERS, 1979, 15 (05) :150-152
[2]   THRESHOLDS OF IMPACT IONIZATION IN SEMICONDUCTORS [J].
BUDE, J ;
HESS, K .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (08) :3554-3561
[3]   EXPERIMENTAL-DETERMINATION OF IMPACT IONIZATION COEFFICIENTS IN (100) GAAS [J].
BULMAN, GE ;
ROBBINS, VM ;
BRENNAN, KF ;
HESS, K ;
STILLMAN, GE .
IEEE ELECTRON DEVICE LETTERS, 1983, 4 (06) :181-185
[4]   TEMPERATURE DEPENDENCE OF IONIZATION RATES IN GAAS [J].
CHANG, YJ ;
SZE, SM .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (13) :5392-&
[5]  
COHEN ML, 1971, PHYSICS SEMIMETALS N, P303
[6]   MONTE-CARLO SIMULATION OF TRANSPORT IN TECHNOLOGICALLY SIGNIFICANT SEMICONDUCTORS OF THE DIAMOND AND ZINCBLENDE STRUCTURES .2. SUBMICROMETER MOSFETS [J].
FISCHETTI, MV ;
LAUX, SE .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (03) :650-660
[7]   MONTE-CARLO ANALYSIS OF ELECTRON-TRANSPORT IN SMALL SEMICONDUCTOR-DEVICES INCLUDING BAND-STRUCTURE AND SPACE-CHARGE EFFECTS [J].
FISCHETTI, MV ;
LAUX, SE .
PHYSICAL REVIEW B, 1988, 38 (14) :9721-9745
[8]   MONTE-CARLO SIMULATION OF TRANSPORT IN TECHNOLOGICALLY SIGNIFICANT SEMICONDUCTORS OF THE DIAMOND AND ZINCBLENDE STRUCTURES .1. HOMOGENEOUS TRANSPORT [J].
FISCHETTI, MV .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (03) :634-649
[9]   IONIZATION RATE IN GAAS DETERMINED FROM PHOTOMULTIPLICATION IN A SCHOTTKY-BARRIER [J].
GLOVER, GH .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (07) :3253-3256
[10]   AVALANCHE BREAKDOWN OF GALLIUM ARSENIDE P-N JUNCTIONS [J].
HALL, R ;
LECK, JH .
INTERNATIONAL JOURNAL OF ELECTRONICS, 1968, 25 (06) :529-&