Influence of substrate temperature on ultraviolet emission of ZnO films prepared by ultrasonic spray pyrolysis

被引：14

作者：

Choi, MH

Ma, TY ^{[1
]}

机构：

[1] Gyeongsang Natl Univ, Dept Elect Engn, Jinju 660701, South Korea

[2] Gyeongsang Natl Univ, Res Inst Comp Informat Commun, Jinju 660701, South Korea

来源：

JOURNAL OF MATERIALS SCIENCE | 2006年 / 41卷 / 02期

关键词：

D O I：

10.1007/s10853-005-2280-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ZnO films were deposited on MgO substrates (ZnO/MgO) by ultrasonic spray pyrolysis. Substrate temperature varied from 200 to 350 degrees C. The crystallographic properties and surface morphologies of the ZnO/MgO films were studied by X-ray diffraction and scanning electron microscopy. The properties of photoluminescence (PL) for the films were investigated by dependence of PL spectra on the substrate temperature and the ambient temperature. Ultraviolet (UV) emission peak (3.37 eV) was dominantly detected at 18 K, which sustained at 300 K with a reduced value of the peak energy. The ZnO/MgO films prepared at 350 degrees C showed the strongest UV emission peak at 18 and 300 K among the films in this study. (c) 2006 Springer Science + Business Media, Inc.

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页码：431 / 435

页数：5

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