Optoelectronic properties and applications of rare-earth-doped GaN

被引:236
作者
Steckl, AJ
Zavada, JM
机构
关键词
D O I
10.1557/S0883769400053045
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The utility of increasing the bandgap of the semiconductor host is addressed. The recent development in the RE doping of wide-bandgap semiconductor GaN for RE-activated light emission at visible and near-IR wavelengths is discussed. It is shown that in GaN, no significant thermal quenching of the luminescence activity is observed up to temperatures as high as 275°C.
引用
收藏
页码:33 / 38
页数:6
相关论文
共 35 条
[1]  
[Anonymous], 1991, SEMICONDUCTORS+, DOI DOI 10.1007/978-3-642-45681-7
[2]   Growth and morphology of Er-doped GaN on sapphire and hydride vapor phase epitaxy substrates [J].
Birkhahn, R ;
Hudgins, R ;
Lee, D ;
Steckl, AJ ;
Molnar, RJ ;
Saleh, A ;
Zavada, JM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (03) :1195-1199
[3]   Red light emission by photoluminescence and electroluminescence from Pr-doped GaN on Si substrates [J].
Birkhahn, R ;
Garter, M ;
Steckl, AJ .
APPLIED PHYSICS LETTERS, 1999, 74 (15) :2161-2163
[4]   Green emission from Er-doped GaN grown by molecular beam epitaxy on Si substrates [J].
Birkhahn, R ;
Steckl, AJ .
APPLIED PHYSICS LETTERS, 1998, 73 (15) :2143-2145
[5]  
BIRKHAHN R, UNPUB
[6]  
BIRKHAHN R, 1999, MRS INT J NITRIDE SE
[7]   Development of an Er-Ni liquid alloy ion source [J].
Chao, LC ;
Steckl, AJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (03) :1056-1058
[8]   Room-temperature visible and infrared photoluminescence from Pr-implanted GaN films by focused-ion-beam direct write [J].
Chao, LC ;
Steckl, AJ .
APPLIED PHYSICS LETTERS, 1999, 74 (16) :2364-2366
[9]  
CHAO LC, UNPUB
[10]   INTENSE ERBIUM-1.54-MU-M PHOTOLUMINESCENCE FROM 2 TO 525 K IN ION-IMPLANTED 4H, 6H, 15R, AND 3C SIC [J].
CHOYKE, WJ ;
DEVATY, RP ;
CLEMEN, LL ;
YOGANATHAN, M ;
PENSL, G ;
HASSLER, C .
APPLIED PHYSICS LETTERS, 1994, 65 (13) :1668-1670