Simplified method to calculate the band bending and the subband energies in MOS capacitors

被引:32
作者
Mueller, HH
Schulz, MJ
机构
[1] Institute of Applied Physics, University of Erlangen-Nürnberg
关键词
D O I
10.1109/16.622612
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A simplified method is introduced to calculate the band bending, the charge densities, and the quantum mechanical fingerprint of the metal-oxide-semiconductor (MOS) capacitor in depletion and inversion, The model features self-consistency of the main quantum mechanical parameters of the system with a low numerical effort in the computation, Example computations are presented, the results of which are close to those obtained from much more complicated, fully self-consistent calculations.
引用
收藏
页码:1539 / 1543
页数:5
相关论文
共 9 条
[1]   ELECTRONIC-PROPERTIES OF TWO-DIMENSIONAL SYSTEMS [J].
ANDO, T ;
FOWLER, AB ;
STERN, F .
REVIEWS OF MODERN PHYSICS, 1982, 54 (02) :437-672
[3]   INTRODUCTION TO SILICON INVERSION LAYERS [J].
PEPPER, M .
CONTEMPORARY PHYSICS, 1977, 18 (05) :423-454
[4]  
Selberherr S., 1984, Analysis and Simulation of Semiconductor Devices
[5]  
SNOWDEN CM, 1989, SEMICONDUCTOR DEVICE
[6]   PROPERTIES OF SEMICONDUCTOR SURFACE INVERSION LAYERS IN ELECTRIC QUANTUM LIMIT [J].
STERN, F ;
HOWARD, WE .
PHYSICAL REVIEW, 1967, 163 (03) :816-&
[7]  
Stern F., 1974, Critical Reviews in Solid State Sciences, V4, P499
[8]  
SZE SM, 1981, PHYSICS SEMICONDUCTO
[9]  
Wolf S., 1995, SILICON PROCESSING V, V3