Energy dissipation in atomic force microscopy and atomic loss processes -: art. no. 265502

被引:95
作者
Hoffmann, PM
Jeffery, S
Pethica, JB
Özer, HÖ
Oral, A
机构
[1] Wayne State Univ, Dept Phys, Detroit, MI 48201 USA
[2] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[3] Bilkent Univ, Dept Phys, Ankara, Turkey
关键词
D O I
10.1103/PhysRevLett.87.265502
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Atomic scale dissipation is of great interest in nanomechanics and atomic manipulation. We present dissipation measurements with a linearized, ultrasmall amplitude atomic force microscope which is capable of measuring dissipation at chosen, fixed separations. We show that the dynamic dissipation in the noncontact regime is of the order of a few 10-100 meV per cycle. This dissipation is likely due to the motion of a bistable atomic defect in the tip-surface region. In the contact regime we observe dc hysteresis associated with nanoscale plasticity. We find the hysteretic energy loss to be 1 order of magnitude higher for a silicon surface than for copper.
引用
收藏
页码:265502 / 1
页数:4
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