Defect characterization of etch pits in ZnSe based epitaxial layers

被引:14
作者
Uren, GD
Goorsky, MS
MeisHaugen, G
Law, KK
Miller, TJ
Haberern, KW
机构
[1] 3M CTR,CORP RES LABS,ST PAUL,MN 55144
[2] PHILIPS RES LABS,BRIARCLIFF MANOR,NY 10510
关键词
D O I
10.1063/1.117067
中图分类号
O59 [应用物理学];
学科分类号
摘要
Three distinct etch pit features in ZnSe based epitaxial layers have been identified. The features were observed with optical dark field microscopy and confirmed to be pits using scanning electron microscopy. Using transmission electron microscopy, we associated different etch pits with characteristic crystallographic defects which are common in epitaxially grown II-VI materials. Frank-type stacking faults form the largest etch pit followed by a paired configuration of Shockley-type stacking faults. The smallest etch pit is due to a single Shockley-type stacking fault. This study represents one of the first examples of identifying crystallographic defects in II-VI wide bandgap materials using etch pit delineation. (C) 1996 American Institute of Physics.
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页码:1089 / 1091
页数:3
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