Gain limiting processes in Er-doped Si nanocrystal waveguides in SiO2

被引:71
作者
Kik, PG [1 ]
Polman, A [1 ]
机构
[1] FOM, Inst Atom & Mol Phys, NL-1098 SJ Amsterdam, Netherlands
关键词
D O I
10.1063/1.1418417
中图分类号
O59 [应用物理学];
学科分类号
摘要
Erbium-doped Si nanocrystal based optical waveguides were formed by Er and Si ion implantation into SiO2. Optical images of the waveguide output facet show a single, well-confined optical mode. Transmission measurements reveal a clear Er related absorption of 2.7 dB/cm at 1.532 mum, corresponding to a cross section of 8x10(-20) cm(2). The Si nanocrystals act as sensitizers for Er but under high doping conditions (similar to 50 Er ions per nanocrystals) no pump-induced change in the Er related absorption is observed under optical pumping (lambda =458 nm), which is ascribed to an Auger quenching effect. For very high pump powers, a broad absorption feature is observed, attributed to free carrier absorption. (C) 2002 American Institute of Physics.
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页码:534 / 536
页数:3
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