Real-time monitoring of the Si carbonization process by a combined method of reflection high-energy electron diffraction and Auger electron spectroscopy

被引:17
作者
Kosugi, R [1 ]
Takakuwa, Y [1 ]
Kim, KS [1 ]
Abukawa, T [1 ]
Kono, S [1 ]
机构
[1] Tohoku Univ, Sci Measurements Res Inst, Sendai, Miyagi 9808577, Japan
关键词
D O I
10.1063/1.124230
中图分类号
O59 [应用物理学];
学科分类号
摘要
The carbonization process of a preferential-domain Si(001)2 x 1 surface with ethylene was investigated by a combined method of reflection high-energy electron diffraction and Auger electron spectroscopy. It is found that the carbonization process during the so-called incubation time is the Si1-xCx alloy formation before the nucleation of 3C-SiC grains. A reaction model for the Si1-xCx alloy formation and for the 3C-SiC grain growth is proposed for substrate temperatures of 600-750 degrees C. From the model, we postulate that the external supply of Si and C should be started just at the completion of the lateral 3C-SiC grain growth at temperatures of 600-650 degrees C in order to obtain thick 3C-SiC layers with a flat surface morphology. (C) 1999 American Institute of Physics. [S0003-6951(99)03326-4].
引用
收藏
页码:3939 / 3941
页数:3
相关论文
共 15 条
[1]   Time-resolved reflection high-energy electron diffraction analysis in initial stage of 3C-SiC growth on Si(001) by gas source molecular beam epitaxy [J].
Hatayama, T ;
Fuyuki, T ;
Matsunami, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (10) :5255-5260
[2]   Reflection high energy electron diffraction and Auger electron spectroscopy (RHEED-AES) observation of Bi desorption from a single-domain Si(001)2x1-Bi surface [J].
Kim, KS ;
Takakuwa, Y ;
Mori, Y ;
Kono, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1996, 35 (12B) :L1695-L1698
[3]   RHEED-AES observation of Sb surface segregation during Sb-mediated Si MBE on Si(0 0 1) [J].
Kim, KS ;
Takakuwa, Y ;
Abukawa, T ;
Kono, S .
JOURNAL OF CRYSTAL GROWTH, 1998, 186 (1-2) :95-103
[4]   Surface-structure-controlled heteroepitaxial growth of 3C-SiC(001)3x2 on Si(001): Simulations and experiments [J].
Kitabatake, M ;
Greene, JE .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (10) :5261-5273
[5]   Surface electromigration of metals on Si(001):In/Si(001) [J].
Kono, S ;
Goto, T ;
Ogura, Y ;
Abukawa, T .
SURFACE SCIENCE, 1999, 420 (2-3) :200-212
[6]   X-ray photoelectron diffraction study of Si(001)c(4x4)-C surface [J].
Kosugi, R ;
Sumitani, S ;
Abukawa, T ;
Takakuwa, Y ;
Suzuki, S ;
Sato, S ;
Kono, S .
SURFACE SCIENCE, 1998, 412-13 :125-131
[7]   Reaction of Si surfaces with a C2H4 beam [J].
Kusunoki, I ;
Takagaki, T ;
Ishidzuka, S ;
Igari, Y ;
Takaoka, T .
SURFACE SCIENCE, 1997, 380 (01) :131-144
[8]   MECHANISMS OF SIC GROWTH BY ALTERNATE SUPPLY OF SIH2CL2 AND C2H2 [J].
NAGASAWA, H ;
YAMAGUCHI, Y .
APPLIED SURFACE SCIENCE, 1994, 82-3 :405-409
[9]  
Olesinski R.W., 1984, Bulletin of Alloy Phase Diagrams, V5, P486, DOI [10.1007/BF02872902, 10.1007/BF02872902., DOI 10.1007/BF02872902]
[10]   SI(001) STEP DYNAMICS [J].
PEARSON, C ;
BOROVSKY, B ;
KRUEGER, M ;
CURTIS, R ;
GANZ, E .
PHYSICAL REVIEW LETTERS, 1995, 74 (14) :2710-2713