Correlation of cathodoluminescence inhomogeneity with microstructural defects in epitaxial GaN grown by metalorganic chemical-vapor deposition

被引:521
作者
Rosner, SJ
Carr, EC
Ludowise, MJ
Girolami, G
Erikson, HI
机构
[1] Hewlett-Packard Laboratories, Palo Alto
关键词
D O I
10.1063/1.118322
中图分类号
O59 [应用物理学];
学科分类号
摘要
We discuss the relationship between microstructure and luminescence efficiency for heteroepitaxial films of GaN grown on c-axis sapphire substrates by metalorganic chemical-vapor deposition. We directly characterize the correlation between threading dislocations as observed by transmission electron microscopy, surface morphology as observed by atomic force microscopy, and wavelength-resolved cathodoluminescence imaging. We show that the inhomogeneity in the luminescence intensity of these films near band edge can be accounted for by a simple model where nonradiative recombination at threading dislocations causes a deficiency of minority carriers and results in dark regions of the epilayer. An upper bound for average diffusion length is estimated to be 250 nm. (C) 1997 American Institute of Physics.
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页码:420 / 422
页数:3
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