Low frequency and 1/f noise in wide-gap semiconductors: silicon carbide and gallium nitride

被引:21
作者
Levinshtein, ME [1 ]
Rumyantsev, SL
Shur, MS
Gaska, R
Khan, MA
机构
[1] Russian Acad Sci, AF Ioffe Phys Tech Inst, Solid State Elect Div, St Petersburg 194021, Russia
[2] Rensselaer Polytech Inst, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA
[3] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA
[4] Sensor Elect Technol Inc, Latham, NY 12110 USA
[5] Univ S Carolina, Dept Elect & Comp Engn, Columbia, SC 29208 USA
来源
IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS | 2002年 / 149卷 / 01期
关键词
D O I
10.1049/ip-cds:20020328
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The results of experimental and theoretical studies of low-frequency noise in wide-bandgap semiconductors and wide-band-gap semiconductor devices Lire reviewed. The unusual features of the low-frequency noise in these systems include an extremely low level of noise in SiC and SiC-based devices and a large difference in the noise level in GaN-based films and GaN-based field effect transistors (FETs) (with the noise being much smaller in GaN-based FETs). The authors also report on the generation-recombination noise in SiC and GaN-based materials and devices.
引用
收藏
页码:32 / 39
页数:8
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