AlGaN/GaN round-HEMTs on (111) silicon substrates

被引:7
作者
Javorka, P [1 ]
Alam, A
Nastase, N
Marso, M
Hardtdegen, H
Heuken, M
Lüth, H
Kordos, P
机构
[1] Res Ctr Julich, Inst Thin Film & Interfaces, D-52425 Julich, Germany
[2] AIXTRON AG, D-52072 Aachen, Germany
关键词
D O I
10.1049/el:20010926
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
AlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static characteristics investigated. The AlGaN GaN (x = 0.23) material structures were grown on (III) p-Si by LP-MOVPE. Devices with 0.3 mum gate length exhibit a saturation current of 0.82 A/mm, a good pinch-off and a peak extrinsic transconductance of 110 mS/mm. Highest saturation current reported so far and static output characteristics up to 20V demonstrate that the devices are capable of handling 16 W/mm of static beat dissipation without any degradation of their performance.
引用
收藏
页码:1364 / 1366
页数:3
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