Fabrication of boron-carbide/boron heterojunction devices

被引：58

作者：

Hwang, SD ^{[1
]}

Byun, D ^{[1
]}

Ianno, NJ ^{[1
]}

Dowben, PA ^{[1
]}

Kim, HR ^{[1
]}

机构：

[1] RES INST IND SCI & TECHNOL,POHANG 790600,SOUTH KOREA

来源：

APPLIED PHYSICS LETTERS | 1996年 / 68卷 / 11期

关键词：

D O I：

10.1063/1.116266

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have succeeded in the fabrication of a boron-carbide/boron diode on an aluminum substrate, and a boron-carbide/boron junction field effect transistor. Our results suggest that with respect to the approximately 2 eV band gap pure boron material, 0.9 eV band gap boron-carbide (B5C) acts as a p-type material. Both boron and boron-carbide (B5C) thin films were fabricated from single source borane cage molecules using plasma enhanced chemical vapor deposition (PECVD). Epitaxial growth does not appear to be a requirement. (C) 1996 American Institute of Physics.

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页码：1495 / 1497

页数：3

相关论文

共 11 条

[1] COMPARISON OF DIFFERENT CHEMICAL-VAPOR-DEPOSITION METHODOLOGIES FOR THE FABRICATION OF HETEROJUNCTION BORON-CARBIDE DIODES [J].

BYUN, D ;

SPADY, BR ;

IANNO, NJ ;

DOWBEN, PA .

NANOSTRUCTURED MATERIALS, 1995, 5 (04) :465-471

[2] HETEROJUNCTION FABRICATION BY SELECTIVE-AREA CHEMICAL-VAPOR-DEPOSITION INDUCED BY SYNCHROTRON-RADIATION [J].

BYUN, DG ;

HWANG, SD ;

DOWBEN, PA ;

PERKINS, FK ;

FILIPS, F ;

IANNO, NJ .

APPLIED PHYSICS LETTERS, 1994, 64 (15) :1968-1970

[3] INNER-SHELL EXCITATION OF BORANES AND CARBORANES [J].

HITCHCOCK, AP ;

WEN, AT ;

LEE, SW ;

GLASS, JA ;

SPENCER, JT ;

DOWBEN, PA .

JOURNAL OF PHYSICAL CHEMISTRY, 1993, 97 (31) :8171-8181

[4] CHARACTERIZATION OF BORON-CARBIDE THIN-FILMS FABRICATED BY PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION FROM BORANES [J].

LEE, S ;

MAZUROWSKI, J ;

RAMSEYER, G ;

DOWBEN, PA .

JOURNAL OF APPLIED PHYSICS, 1992, 72 (10) :4925-4933

[5] THE PROPERTIES OF BORON-CARBIDE SILICON HETEROJUNCTION DIODES FABRICATED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION [J].

LEE, SW ;

DOWBEN, PA .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1994, 58 (03) :223-227

[6]

LUND JC, 1990, MATER RES SOC SYMP P, V162, P601

[7]

MAZUROWSKI J, 1992, MATER RES SOC SYMP P, V242, P637, DOI 10.1557/PROC-242-637

[8]

MAZUROWSKI J, 1991, MATER RES SOC SYMP P, V190, P101

[9] SYNCHROTRON-RADIATION-INDUCED DEPOSITION OF BORON AND BORON-CARBIDE FILMS FROM BORANES AND CARBORANES - DECABORANE [J].

PERKINS, FK ;

ROSENBERG, RA ;

LEE, SW ;

DOWBEN, PA .

JOURNAL OF APPLIED PHYSICS, 1991, 69 (07) :4103-4109

[10]

ROBSON HE, 1959, THESIS U KANSAS