Scaling Potential of Local Redox Processes in Memristive SrTiO3 Thin-Film Devices

被引:63
作者
Dittmann, Regina [1 ]
Muenstermann, Ruth [1 ]
Krug, Ingo [1 ]
Park, Daesung [2 ]
Menke, Tobias [1 ]
Mayer, Joachim [2 ]
Besmehn, Astrid [3 ]
Kronast, Florian [4 ]
Schneider, Claus Michael [1 ]
Waser, Rainer [1 ,5 ]
机构
[1] Forschungszentrum Julich, Peter Grunberg Inst, Fundamentals Future Informat Technol JARA FIT, D-52425 Julich, Germany
[2] Rhein Westfal TH Aachen, Cent Facil Electron Microscopy, D-52074 Aachen, Germany
[3] Forschungszentrum Julich, Zent Abt Chem Anal, D-52425 Julich, Germany
[4] Helmholtz Zentrum Berlin, D-12489 Berlin, Germany
[5] Rhein Westfal TH Aachen, Inst Werkstoffe Elektrotech 2, D-52056 Aachen, Germany
关键词
Device scaling; memristive device; redox process; resistive switching; transition metal oxides; DOPED SRTIO3; NONVOLATILE MEMORY; TRANSITION; SURFACE; MODEL;
D O I
10.1109/JPROC.2012.2188771
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we address the following question: Where do the resistive switching processes take place in memristive thin-film devices of the single crystalline model material Fe-doped SrTiO3? We compare resistive switching induced by the tip of the atomic force microscope on the bare thin-film surface with the switching properties observed in memristive devices with Pt top electrode. In order to close the gap between these two approaches, we combine conductive-tip atomic force microscopy with a delamination technique to remove the top electrode of Fe-doped SrTiO3 metal-insulator-metal (MIM) structures to gain insight into the active switching interface with nanoscale lateral resolution. This enables us to prove the coexistence of a filamentary and area-dependent switching process with opposite switching polarities in the same sample. The spatially resolved analysis by transmission electron microscopy and photoelectron spectromicroscopy gives us some hints that the two switching types take place in device regions with different defect density and significant stoichiometry difference.
引用
收藏
页码:1979 / 1990
页数:12
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