Making Patterns on Graphene

被引：99

作者：

Zhou, Yong ^{[1
]}

Loh, Kian Ping ^{[2
]}

机构：

[1] Nanjing Univ, Sch Phys, ERERC, Natl Lab Solid State Microstruct, Nanjing 210093, Jiangsu, Peoples R China

[2] Natl Univ Singapore, Fac Sci, Dept Chem, Singapore 117543, Singapore

来源：

ADVANCED MATERIALS | 2010年 / 22卷 / 32期

关键词：

OXIDE; FILMS; ELECTRODES; ARRAYS;

D O I：

10.1002/adma.201000436

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Graphene-based nanostructures are considered as promising alternatives to silicon-based mesostructures in future electronic nanodevices. The lithographical patterning of graphene, which are essential steps in any form of microelectronic processing, present interesting challenges because of the atomic layer thickness of graphene. Mesoscopic devices based on graphene require high spatial resolution patterning that will induce as little damage as possible. This research news highlights and evaluates recent developments in the nanostructuring and patterning of graphene.

引用

页码：3615 / 3620

页数：6

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