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- [3] Beer F.P., 1981, MECH MATER
- [4] BOWDEN MJ, 1994, INTRO MICROLITHOGRAP, pCH2
- [5] Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platforms [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 3303 - 3307
- [7] PATTERNING CHARACTERISTICS OF A CHEMICALLY-AMPLIFIED NEGATIVE RESIST IN SYNCHROTRON RADIATION LITHOGRAPHY [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1992, 31 (9A): : 2954 - 2958