Deformation of nanoscopic polymer structures in response to well-defined capillary forces

被引:62
作者
Stoykovich, MP
Cao, HB
Yoshimoto, K
Ocola, LE
Nealey, PF
机构
[1] Univ Wisconsin, Dept Chem Engn, Madison, WI 53706 USA
[2] Univ Wisconsin, Ctr Nanotechnol, Madison, WI 53706 USA
[3] Agere Syst, Adv Lithog Res, Murray Hill, NJ 07974 USA
关键词
D O I
10.1002/adma.200305059
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The development of strategies to measure the properties of materials with nanoscopic dimensions is a necessary but challenging topic in nanoscale science and technology. Here, combinatorial arrays of specially designed test structures are used to quantify the deformation of micro- and nanoscale polymer beams in response to well-defined capillary forces. In the Figure, increasing capillary forces from left to right act on beams 95 nm wide.
引用
收藏
页码:1180 / +
页数:6
相关论文
共 29 条
  • [1] Influence of noncontact dissipation in the tapping mode:: Attempt to extract quantitative information on the surface properties with the local force probe method
    Aimé, JP
    Boisgard, R
    Nony, L
    Couturier, G
    [J]. JOURNAL OF CHEMICAL PHYSICS, 2001, 114 (11) : 4945 - 4954
  • [2] Quantitative imaging of nanoscale mechanical properties using hybrid nanoindentation and force modulation
    Asif, SAS
    Wahl, KJ
    Colton, RJ
    Warren, OL
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 90 (03) : 1192 - 1200
  • [3] Beer F.P., 1981, MECH MATER
  • [4] BOWDEN MJ, 1994, INTRO MICROLITHOGRAP, pCH2
  • [5] Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platforms
    Cao, HB
    Nealey, PF
    Domke, WD
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 3303 - 3307
  • [6] Lateral stiffness: A new nanomechanical measurement for the determination of shear strengths with friction force microscopy
    Carpick, RW
    Ogletree, DF
    Salmeron, M
    [J]. APPLIED PHYSICS LETTERS, 1997, 70 (12) : 1548 - 1550
  • [7] PATTERNING CHARACTERISTICS OF A CHEMICALLY-AMPLIFIED NEGATIVE RESIST IN SYNCHROTRON RADIATION LITHOGRAPHY
    DEGUCHI, K
    MIYOSHI, K
    ISHII, T
    MATSUDA, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1992, 31 (9A): : 2954 - 2958
  • [8] A method for interpreting the data from depth-sensing indentation instruments
    Doerner, M. F.
    Nix, W. D.
    [J]. JOURNAL OF MATERIALS RESEARCH, 1986, 1 (04) : 601 - 609
  • [9] A methodology for determining mechanical properties of freestanding thin films and MEMS materials
    Espinosa, HD
    Prorok, BC
    Fischer, M
    [J]. JOURNAL OF THE MECHANICS AND PHYSICS OF SOLIDS, 2003, 51 (01) : 47 - 67
  • [10] Effect of free surfaces on the glass transition temperature of thin polymer films
    Forrest, JA
    DalnokiVeress, K
    Stevens, JR
    Dutcher, JR
    [J]. PHYSICAL REVIEW LETTERS, 1996, 77 (10) : 2002 - 2005