Continuous hot wire chemical vapor deposition of high-density carbon multiwall nanotubes

被引:41
作者
Dillon, AC [1 ]
Mahan, AH [1 ]
Parilla, PA [1 ]
Alleman, JL [1 ]
Heben, MJ [1 ]
Jones, KM [1 ]
Gilbert, KEH [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
关键词
D O I
10.1021/nl0342038
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Hot wire chemical vapor deposition (HWCVD) has been adapted to be a continuous growth process for high-density carbon multiwall nanotubes (MWNTs). MWNT growth is optimized in 1:5 CH4:Ar at 150 Torr with reactor temperatures of 400 and 550 degreesC for static and flowing gases, respectively. Ferrocene is employed to provide a gas-phase catalyst. Highly graphitic nanotubes can be continuously deposited with iron content as low as 15 wt % and carbon impurities below thermal gravimetric analysis detection limits. The MWNTs are simply purified to similar to99.5 wt % with minimal structural damage and with a 75 wt % yield.
引用
收藏
页码:1425 / 1429
页数:5
相关论文
共 39 条
  • [1] Continuous production of aligned carbon nanotubes: a step closer to commercial realization
    Andrews, R
    Jacques, D
    Rao, AM
    Derbyshire, F
    Qian, D
    Fan, X
    Dickey, EC
    Chen, J
    [J]. CHEMICAL PHYSICS LETTERS, 1999, 303 (5-6) : 467 - 474
  • [2] HIGH-RESOLUTION ELECTRON-MICROSCOPY AND INELASTIC LIGHT-SCATTERING OF PURIFIED MULTISHELLED CARBON NANOTUBES
    BACSA, WS
    UGARTE, D
    CHATELAIN, A
    DEHEER, WA
    [J]. PHYSICAL REVIEW B, 1994, 50 (20) : 15473 - 15476
  • [3] Nucleation and growth of carbon nanotubes by microwave plasma chemical vapor deposition
    Bower, C
    Zhou, O
    Zhu, W
    Werder, DJ
    Jin, SH
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (17) : 2767 - 2769
  • [4] Hot filament for in situ catalyst supply in the chemical vapor deposition growth of carbon nanotubes
    Chen, CF
    Lin, CL
    Wang, CM
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2002, 41 (1AB): : L67 - L69
  • [5] Preparation of high yield multi-walled carbon nanotubes by microwave plasma chemical vapor deposition at low temperature
    Chen, M
    Chen, CM
    Chen, CF
    [J]. JOURNAL OF MATERIALS SCIENCE, 2002, 37 (17) : 3561 - 3567
  • [6] Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperature
    Choi, YC
    Bae, DJ
    Lee, YH
    Lee, BS
    Park, GS
    Choi, WB
    Lee, NS
    Kim, JM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (04): : 1864 - 1868
  • [7] Novel plasma chemical vapor deposition method of carbon nanotubes at low temperature for field emission display application
    Chung, SJ
    Lim, SH
    Lee, CH
    Jang, J
    [J]. DIAMOND AND RELATED MATERIALS, 2001, 10 (02) : 248 - 253
  • [8] Dillon AC, 1999, ADV MATER, V11, P1354, DOI 10.1002/(SICI)1521-4095(199911)11:16<1354::AID-ADMA1354>3.0.CO
  • [9] 2-N
  • [10] LARGE-SCALE SYNTHESIS OF CARBON NANOTUBES
    EBBESEN, TW
    AJAYAN, PM
    [J]. NATURE, 1992, 358 (6383) : 220 - 222