Effect of organic contamination on the electrical degradation of hydrogen-terminated silicon upon exposure to air under ambient conditions

被引:9
作者
Liu, YJ [1 ]
Yu, HZ [1 ]
机构
[1] Simon Fraser Univ, Dept Chem, Burnaby, BC V5A 1S6, Canada
关键词
D O I
10.1149/1.1627353
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The degradation of the electrical characteristics of hydrogen-terminated silicon (both n- and p-doped) under typical laboratory environments was investigated. When a hydrogen-terminated silicon (H-Si) surface was exposed to air under ambient conditions, the current density/bias voltage (J-V) curve of the mercury-silicon junction thus formed changed significantly during the first 50 h. For n- type H-Si surfaces, the J-V curve initially maintained ohmic characteristics for a period of 8-12 h, then evolved to diode behavior; for p-doped samples, the current density showed a rapid increase and reached a maximum in about 20 h. In both cases, the electrical property was recovered to some extent after sonication in organic solvents. In agreement with infrared spectroscopic results, organic contamination upon exposure to ambient air is suggested to play an important role in the change of the electrical performance of hydrogen-terminated silicon. (C) 2003 The Electrochemical Society.
引用
收藏
页码:G861 / G865
页数:5
相关论文
共 41 条
[1]   Structural characterization of organic monolayers on Si⟨111⟩ from capacitance measurements [J].
Allongue, P ;
de Villeneuve, CH ;
Pinson, J .
ELECTROCHIMICA ACTA, 2000, 45 (20) :3241-3248
[2]   The preparation of flat H-Si(111) surfaces in 40% NH4F revisited [J].
Allongue, P ;
de Villeneuve, CH ;
Morin, S ;
Boukherroub, R ;
Wayner, DDM .
ELECTROCHIMICA ACTA, 2000, 45 (28) :4591-4598
[3]   Organometallic chemistry on silicon and germanium surfaces [J].
Buriak, JM .
CHEMICAL REVIEWS, 2002, 102 (05) :1271-1308
[4]   Electrochemical study of atomically flattening process of silicon in 40% NH4F solution [J].
Fukidome, H ;
Matsumura, M .
APPLIED SURFACE SCIENCE, 1998, 130 :146-150
[5]   Rate theory of multicomponent adsorption of organic species on silicon wafer surface [J].
Habuka, H ;
Shimada, M ;
Okuyama, K .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (06) :2319-2323
[6]   COMPARISON OF SI(111) SURFACES PREPARED USING AQUEOUS-SOLUTIONS OF NH4F VERSUS HF [J].
HIGASHI, GS ;
BECKER, RS ;
CHABAL, YJ ;
BECKER, AJ .
APPLIED PHYSICS LETTERS, 1991, 58 (15) :1656-1658
[7]   IDEAL HYDROGEN TERMINATION OF THE SI-(111) SURFACE [J].
HIGASHI, GS ;
CHABAL, YJ ;
TRUCKS, GW ;
RAGHAVACHARI, K .
APPLIED PHYSICS LETTERS, 1990, 56 (07) :656-658
[8]   DC CONDUCTION IN LANGMUIR-BLODGETT FILMS WITH VARIOUS ELECTRODE MATERIALS [J].
HONIG, EP .
THIN SOLID FILMS, 1976, 33 (02) :231-236
[9]   ATOMIC RESOLUTION IMAGES OF H-TERMINATED SI(111) SURFACES IN AQUEOUS-SOLUTIONS [J].
ITAYA, K ;
SUGAWARA, R ;
MORITA, Y ;
TOKUMOTO, H .
APPLIED PHYSICS LETTERS, 1992, 60 (20) :2534-2536
[10]   LEAD CONTACTS ON SI(111) - H-1 X-1 SURFACES [J].
KAMPEN, TU ;
MONCH, W .
SURFACE SCIENCE, 1995, 331 :490-495