Identification of gate electrode discontinuities in submicron CMOS technologies, and effect on circuit performance

被引:8
作者
Jenkins, KA
Burghartz, JN
Agnello, PD
机构
[1] IBM Research Division, IBM T. J. Watson Research Center, Yorktown Heights
[2] IBM Advanced Silicon Technology Center, Hopewell Junction
关键词
D O I
10.1109/16.491253
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An experiment to determine the effect of gate electrode resistivity on circuit speed gave unexpected results: circuits with the lowest sheet resistance had the poorest circuit speed, Explanation of this behavior required development of a new high-frequency method of measuring the impedance of the gate electrode, This method revealed that the circuits with a composite gate electrode had been formed with a partial discontinuity, The measurement technique is described, and the evidence of the discontinuity is shown, The effect of the discontinuity on device and circuit speed is demonstrated.
引用
收藏
页码:759 / 765
页数:7
相关论文
共 12 条
[1]   TECHNOLOGY LIMITATIONS FOR N+/P+ POLYCIDE GATE CMOS DUE TO LATERAL DOPANT DIFFUSION IN SILICIDE POLYSILICON LAYERS [J].
CHU, CL ;
CHIN, G ;
SARASWAT, KC ;
WONG, SS ;
DUTTON, R .
IEEE ELECTRON DEVICE LETTERS, 1991, 12 (12) :696-698
[2]   DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS [J].
DENNARD, RH ;
GAENSSLEN, FH ;
YU, HN ;
RIDEOUT, VL ;
BASSOUS, E ;
LEBLANC, AR .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1974, SC 9 (05) :256-268
[3]  
FITZPATRICK J, 1978, MICROWAVE J, V21, P63
[4]  
FUJII T, 1994, 1994 SYMPOSIUM ON VLSI TECHNOLOGY, P117, DOI 10.1109/VLSIT.1994.324429
[5]  
GOTO K, 1994, IEICE T ELECTRON, VE77C, P480
[6]   USE OF ELECTRON-BEAM CHARGING FOR IN-PROCESS INSPECTION OF SILICIDE COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR GATE ELECTRODE ISOLATION [J].
JENKINS, KA ;
AGNELLO, PD ;
BRIGHT, AA .
APPLIED PHYSICS LETTERS, 1992, 61 (03) :312-314
[7]  
KOIKE H, 1994 INT EL DEV M, P855
[8]   COMPARISON OF TRANSFORMATION TO LOW-RESISTIVITY PHASE AND AGGLOMERATION OF TISI2 AND COSI2 [J].
LASKY, JB ;
NAKOS, JS ;
CAIN, OJ ;
GEISS, PJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (02) :262-269
[9]  
SHAHIDI GG, 1993, 1993 SYMPOSIUM ON VLSI TECHNOLOGY, P93
[10]  
TAKEUCHI T, P 1995 S VLSI TECHN, P9