Simultaneous imaging of Si(111) 7x7 with atomic resolution in scanning tunneling microscopy, atomic force microscopy, and atomic force microscopy noncontact mode

被引：67

作者：

Guthner, P

机构：

[1] Omicron Vakuumphysik GmbH

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 04期

关键词：

D O I：

10.1116/1.588873

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The reconstructed Si (111) 7x7 surface was imaged in several operation modes of the combined ultrahigh vacuum atomic force microscope/scanning tunnel microscope. By imaging single atom defects on the sample surface a clear proof of the atomic resolution in noncontact mode of the force microscope was possible. By simultaneous measurements of several interaction parameters and by the investigation of force-distance curves, it was possible to explain the origin of the interaction. (C) 1996 American Vacuum Society.

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页码：2428 / 2431

页数：4

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