Nanoimprint lithography: challenges and prospects

被引：174

作者：

Zankovych, S ^{[1
]}

Hoffmann, T

Seekamp, J

Bruch, JU

Torres, CMS

机构：

[1] Univ Gesamthsch Wuppertal, Inst Mat Sci, D-42097 Wuppertal, Germany

[2] Univ Gesamthsch Wuppertal, Dept Elect & Informat Engn, D-42097 Wuppertal, Germany

[3] Interuniv Microelect Ctr, B-3001 Louvain, Belgium

[4] Infineon Technol AG, Dresden, Germany

来源：

NANOTECHNOLOGY | 2001年 / 12卷 / 02期

关键词：

D O I：

10.1088/0957-4484/12/2/303

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We review the salient aspects of nanoimprint lithography and consider the challenges it faces in becoming a standard fabrication technique, such as costs and throughput. We discuss material issues such as visco-elasticity and functionality of the printed material. By way of an illustration, we present printing results of 50 nm features over a 2 x 2 cm(2) area which are reproducible with high fidelity. Data of printing 15 nm features in PMMA using a Cr stamp was obtained.

引用

页码：91 / 95

页数：5

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