Aqueous solution epitaxy of CdS layers on CuInSe2

被引:41
作者
Furlong, MJ
Froment, M
Bernard, MC
Cortes, R
Tiwari, AN
Krejci, M
Zogg, H
Lincot, D
机构
[1] Ecole Natl Super Chim Paris, Unite Associee CNRS, Lab Electrochim & Chim Analyt, F-75231 Paris 05, France
[2] Univ Paris 06, Lab Phys Liquides & Electrochim, Unite Propre CNRS 15, F-75252 Paris, France
[3] Swiss Fed Inst Technol, Thin Film Phys Grp, Inst Quantum Elect, CH-8005 Zurich, Switzerland
关键词
chemical bath deposition; aqueous solution; cadmium sulfide; copper indium diselenide; epitaxy;
D O I
10.1016/S0022-0248(98)00503-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Epitaxial CdS thin films have been deposited from an aqueous ammonia solution containing cadmium ions and thiourea as precursors on single crystalline CuInSe2 films prepared by MBE on Si(1 1 1) and GaAs(1 0 0) substrates. The structure and quality of the films were investigated by RHEED, glancing angle XRD and HRTEM in cross-section. The films are cubic on (1 0 0) substrates, and mixed cubic and hexagonal on (1 1 1) substrates due to the presence of stacking faults parallel to the substrate. The growth is under surface kinetic control with an activation energy of 85 kJ mol(-1). Epitaxy improves with increasing temperature and an epitaxial transition temperature at approx. 60 degrees C is demonstrated in the selected experimental conditions. The epitaxy is very sensitive to the preparation of the surface. Beneficial effects of in situ or ex situ chemical etching are found. Similarities between aqueous solution and vapor-phase chemical depositions are pointed out. (C) 1998 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:114 / 122
页数:9
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