The structure and optoelectronic properties of dislocations in GaN

被引:28
作者
Cherns, D [1 ]
机构
[1] Univ Bristol, HH Wills Phys Lab, Bristol BS8 1TL, Avon, England
关键词
D O I
10.1088/0953-8984/12/49/320
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
This paper reviews the structure of threading dislocations, nanopipes and inversion domains in (0001) GaN films grown by metal-organic chemical vapour deposition. A new mechanism for generation of misfit dislocations in epitaxial laterally overgrown (ELOG) GaN and in AlGaN/GaN interfaces is described. Recent cathodoluminescence studies in the scanning electron microscope are described, showing that individual threading defects act as non-radiative recombination centres in ELOG GaN and in InGaN quantum wells in GaN.
引用
收藏
页码:10205 / 10212
页数:8
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