Dynamics and reactivity of positively charged muonium in heavily doped Si:B and comparisons with hydrogen

被引:14
作者
Mansour, A. I. [1 ]
Salman, Z. [2 ,3 ]
Chow, K. H. [1 ]
Fan, I. [1 ]
King, P. J. C. [3 ]
Hitti, B. [4 ]
Jung, J. [1 ]
Cottrell, S. P. [3 ]
机构
[1] Univ Alberta, Dept Phys, Edmonton, AB T6G 2G7, Canada
[2] Univ Oxford, Dept Phys, Clarendon Lab, Oxford OX1 3PU, England
[3] Rutherford Appleton Lab, ISIS Facil, Didcot OX11 0QX, Oxon, England
[4] TRIUMF, Vancouver, BC V6T 2A3, Canada
关键词
D O I
10.1103/PhysRevLett.100.257602
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The detailed dynamics of the positively charged muonium (Mu(+)) in heavily doped p-type Si:B is reported. Below 200 K, Mu(+) is static and isolated, and is located in a stretched Si-Si bond. Above approximate to 200 K, Mu(+) diffuses incoherently. At temperatures higher than 300 K, the Mu(+)-B(-) complex is formed while above 520 K, it starts to dissociate. There is significant enhancement of the diffusion of Mu(+) in Si compared to H(+) and D(+)-this is attributed to its smaller mass.
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页数:4
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