Electrically detected magnetic resonance of a-Si:H at low magnetic fields:: the influence of hydrogen on the dangling bond resonance

被引:33
作者
Brandt, MS [1 ]
Bayerl, MW
Stutzmann, M
Graeff, CFO
机构
[1] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
[2] USP, FFCLRP, Dept Fis & Matemat, BR-1404091 Ribeirao Preto, Brazil
关键词
a-Si : H; hydrogen; dangling bond resonance;
D O I
10.1016/S0022-3093(98)00073-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The hyperfine interaction between the dangling bonds and the hydrogen atoms in hydrogenated amorphous silicon (a-Si:H) is observed using low-field electrically detected magnetic resonance (EDMR). In deuterated amorphous silicon (a-Si:D), a peak-to-peak linewidth of 1.4 G is found at 434 MHz. Distant hyperfine involving the background hydrogen present in the material is found to broaden the resonance in a-Si:H. The broadening is proportional to the square-root of the hydrogen concentration and reaches 1 G at 10 at.% hydrogen. The Lineshape is more Lorentz-like in the degraded than in the as-grown or annealed states. An identical EDMR signal intensity Delta sigma/sigma is observed for a-Si:H using spectrometers working at 434 MHz, 9 and 34 GHz, indicating that the signal intensity is independent of the Zeeman splitting. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:343 / 347
页数:5
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