Anomalous compositional pulling effect in InGaN/GaN multiple quantum wells

被引:49
作者
Hao, M [1 ]
Ishikawa, H [1 ]
Egawa, T [1 ]
Shao, CL [1 ]
Jimbo, T [1 ]
机构
[1] Nagoya Inst Technol, Res Ctr Nanodevices & Syst, Showa Ku, Nagoya, Aichi 4668555, Japan
关键词
D O I
10.1063/1.1588731
中图分类号
O59 [应用物理学];
学科分类号
摘要
A series of InGaN/GaN multiple quantum wells (MQWs) was grown by metalorganic chemical vapor deposition with different well thickness. High-resolution x-ray diffraction studies revealed that the In composition is increasing along the growth direction from the bottom to the top of each well layer in these MQWs. While the In composition at the bottom of each well layer almost keeps constant, the increasing rate of In composition becomes obviously larger when the growth temperature is decreased. The important conclusion of this study is that the InGaN/GaN MQWs is shaped like a triangle due to the increasing of In composition from the bottom to the top of the well layer. The emission mechanism of the InGaN/GaN MQWs has to be discussed based on the triangular band gap structure. (C) 2003 American Institute of Physics.
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页码:4702 / 4704
页数:3
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