Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region

被引：106

作者：

Klosner, MA ^{[1
]}

Silfvast, WT ^{[1
]}

机构：

[1] Univ Cent Florida, Ctr Res & Educ Opt & Lasers, Orlando, FL 32816 USA

来源：

OPTICS LETTERS | 1998年 / 23卷 / 20期

关键词：

D O I：

10.1364/OL.23.001609

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have observed intense extreme-ultraviolet emission, within the 10-16-nm-wavelength range, emitted by a xenon capillary discharge plasma. Within a 0.3-nm bandwidth centered at 13.5 nm the axial emission intensity was comparable with that from the brightest laser-produced plasma sources, and a similar intensity was measured at approximately 11.3 nm. This source could thus be suitable for extreme-ultraviolet imaging applications, such as extreme-ultraviolet lithography. (C) 1998 Optical Society of America.

引用

页码：1609 / 1611

页数：3

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