Ti1-xAlxN, Ti1-xZrxN and Ti1-xCrxN films synthesized by the AIP method

被引:52
作者
Hasegawa, H [1 ]
Kimura, A [1 ]
Suzuki, T [1 ]
机构
[1] Keio Univ, Dept Mech Engn, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
关键词
Ti1-xAlxN; Ti1-xZrxN; Ti1-xCrxN; arc ion plating;
D O I
10.1016/S0257-8972(00)00737-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Ti1-xAlxN, Ti1-xZrxN and Ti1-xCrxN films were synthesized by changing the contents, x values, using the are ion plating (AIP) method and investigated on micro-Vickers hardness and lattice parameter. The crystal structure of Ti1-xAlxN films changed from the NaCl into wurtzite type at x = 0.6-0.7, while Ti1-xCrxN and Ti1-xZrxN kept the cubic structures with all x values. With increasing content x, the lattice parameters of Ti1-xAlxN and Ti1-xCrxN monotonously decreased from 4.23 Angstrom (x = 0) down to 4.17 Angstrom (x = 0.6) and to 4.16 Angstrom (x = 1.0), respectively. On the other hand, the lattice parameters of Ti1-xZrxN films monotonously increased from 4.23 Angstrom (x = 0) up to 4.58 Angstrom (x = 1.0). The maximum micro-hardness of Ti1-xAlxN, Ti1-xZrxN and Ti(1-x)Ci(x)N films were Hv 3200 (x = 0.6), 3000 (x = 0.5) and 3000 (x = 0.2), respectively. (C) 2000 Published by Elsevier Science S.A. All rights reserved.
引用
收藏
页码:76 / 79
页数:4
相关论文
共 13 条
[1]  
DONOHUE LA, 1995, SURF COAT TECH, V72, P72
[2]   TIXAL1-XN FILMS DEPOSITED BY ION PLATING WITH AN ARC EVAPORATOR [J].
FRELLER, H ;
HAESSLER, H .
THIN SOLID FILMS, 1987, 153 :67-74
[3]   Multicomponent Ti-Zr-N and Ti-Nb-N coatings deposited by vacuum arc [J].
Grimberg, I ;
Zhitomirsky, VN ;
Boxman, RL ;
Goldsmith, S ;
Weiss, BZ .
SURFACE & COATINGS TECHNOLOGY, 1998, 108 (1-3) :154-159
[4]   Microhardness and structural analysis of (TI,AI)N, (Ti,Cr)N, (Ti,Zr)N and (TI,V)N films [J].
Hasegawa, H ;
Kimura, A ;
Suzuki, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (03) :1038-1040
[5]  
IKEDA T, 1991, THIN SOLID FILMS, V195, P99, DOI 10.1016/0040-6090(91)90262-V
[6]   Effects of Al content on hardness, lattice parameter and microstructure of Ti1-xAlxN films [J].
Kimura, A ;
Hasegawa, H ;
Yamada, K ;
Suzuki, T .
SURFACE & COATINGS TECHNOLOGY, 1999, 120 :438-441
[7]   CORROSION BEHAVIOR IN ACID-SOLUTION OF (TI, CR)N-X FILMS DEPOSITED ON GLASS [J].
MASSIANI, Y ;
GRAVIER, P ;
FEDRIZZI, L ;
MARCHETTI, F .
THIN SOLID FILMS, 1995, 261 (1-2) :202-208
[8]  
MUNZ WD, 1986, J VAC SCI TECHNOL A, V4, P2717, DOI 10.1116/1.573713
[9]   DEPOSITION AND CHARACTERIZATION OF TERNARY NITRIDES [J].
RANDHAWA, H ;
JOHNSON, PC ;
CUNNINGHAM, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03) :2136-2139
[10]   Microstructures and grain boundaries of(Ti,Al)N films [J].
Suzuki, T ;
Huang, D ;
Ikuhara, Y .
SURFACE & COATINGS TECHNOLOGY, 1998, 107 (01) :41-47