Fabrication of highly ordered silicon oxide dots and stripes from block copolymer thin films

被引：122

作者：

Park, Soojin ^{[1
]}

Kim, Bokyung ^{[1
]}

Wang, Jia-Yu ^{[1
]}

Russell, Thomas P. ^{[1
]}

机构：

[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA

来源：

ADVANCED MATERIALS | 2008年 / 20卷 / 04期

关键词：

D O I：

10.1002/adma.200701997

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A general route to fabricate highly ordered arrays of nanoscopic silicon oxide dots and stripes (see figure) from block copolymer thin films is described. Poly (styrene-b-4-vinylpyridine) thin films with cylindrical microdomains oriented normal and parallel to the surface were used as templates for the fabrication of nanoscopic silicon oxide, with polydimethylsiloxane as the inorganic precursor.

引用

页码：681 / +

页数：6

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