Interface analysis of amorphous silicon solar cell structures

被引:4
作者
Gutiérrez, MT [1 ]
Maffiotte, C [1 ]
机构
[1] CIEMAT, E-28040 Madrid, Spain
关键词
amorphous silicon; chemical vapour deposition; photovoltaic devices; photoelectron spectroscopy;
D O I
10.1016/S0257-8972(00)01112-9
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Interface properties of amorphous-silicon solar cells have been studied using X-ray photoelectron spectroscopy. The cells used have microcrystalline p- and n-type emitters, and the transparent conductive oxide is commercial SnO2. Compositional information relative to depth has been obtained applying the technique in combination with sputtering for a variable amount of time. I-V characteristics and spectral responses have been interpreted on the basis of the results of the chemical analysis. Certain efficiency-limiting mechanisms have been identified, such as SnO2 chemical reduction by plasma-enhanced chemical vapour deposition (PE-CVD) and aluminium diffusion into the amorphous silicon. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:175 / 180
页数:6
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