Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition

被引：85

作者：

del Campo, A ^{[1
]}

Boos, D ^{[1
]}

Spiess, HW ^{[1
]}

Jonas, U ^{[1
]}

机构：

[1] Max Planck Inst Polymer Forsch, D-55128 Mainz, Germany

来源：

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2005年 / 44卷 / 30期

关键词：

monolayers; photolithography; silanes; surface chemistry;

D O I：

10.1002/anie.200500092

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

(Chemical Equation Presented) Monolayer lithography: The concept of orthogonal cleavage of photolabile protecting groups was demonstrated with self-assembled silane layers on solid surfaces. Nitroveratryloxycarbonyl and benzoin derivatives can be addressed independently by light of different wavelengths to selectively liberate amino and carboxylic acid groups, respectively, in mixed silane layers. Specific colloid adsorption on such photopatterned surfaces was investigated. © 2005 Wiley-VCH Verlag GmbH & Co. KGaA.

引用

页码：4707 / 4712

页数：6

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