Via-hole-based vertical GaN light emitting diodes

被引:21
作者
Jung, Hyun-Min [1 ]
Nam, Gi-Yeon [1 ]
Choi, Byung-Kyun [1 ]
Lee, Tae-Hee [1 ]
Kim, Hyun-Suk [1 ]
Jeon, Soo-Kun [1 ]
Park, Eun-Hyun [1 ]
Kim, Chang-Tae [1 ]
机构
[1] Epivalley Co Ltd, Kwangju 464892, South Korea
关键词
D O I
10.1063/1.2785110
中图分类号
O59 [应用物理学];
学科分类号
摘要
A vertical GaN-light emitting diode (LED) has been fabricated on a sapphire substrate with periodic via holes formed by a laser drilling technique. n-contact metal which was deposited on the backside of sapphire substrate was directly connected with an Ohmic metal of n-GaN layer through the via holes. The via-hole-based vertical GaN-LED demonstrated an optical power improvement of up to 12.5% with lower forward operating voltage compared with a conventional GaN-LED. In addition, this vertical LED showed just 0.8% and 1.5% variations of optical power and operation voltage at the 500 h reliability test.
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页数:3
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