Metalorganic chemical vapor deposition of BaTiO3 and SrTiO3 thin films using a single solution source with a non-contact vaporizer

被引：4

作者：

Ma, WH ^{[1
]}

Schäfer, P ^{[1
]}

Ehrhart, P ^{[1
]}

Waser, P ^{[1
]}

机构：

[1] Forschungszentrum Julich, Inst Festkorperforsch, D-52425 Julich, Germany

来源：

INTEGRATED FERROELECTRICS | 2000年 / 30卷 / 1-4期

关键词：

MOCVD; BaTiO3; SrTiO3; liquid delivery; growth kinetics; composition control;

D O I：

10.1080/10584580008222262

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

BaTiO3 and SrTiO3 thin films were prepared by reduced-pressure metalorganic chemical vapor deposition. Ba(thd)(2)-di-tri, or Sr(thd)(2), and Ti(OPri)(2)-(thd)(2) were dissolved in diglyme and were delivered by an aerosol-assisted non-contact vaporizer. Growth kinetics of the thin films was studied as: a function of growth temperature, liquid source concentration and molar ratio of the metalorganic precursors. The mechanisms of composition control, crystallization and phase formation of the thin films were investigated over a wide range of stoichiometry.

引用

页码：139 / 148

页数：10

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