Laser-induced back ablation of aluminum thin films using picosecond laser pulses

被引：59

作者：

Bullock, AB ^{[1
]}

Bolton, PR ^{[1
]}

机构：

[1] Univ Calif Lawrence Livermore Natl Lab, Livermore, CA 94551 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1999年 / 85卷 / 01期

关键词：

D O I：

10.1063/1.369393

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A study of laser-induced back ablation of aluminum thin film targets with picosecond laser pulses is reported. Ablated plume edge velocities are studied as a function of film thickness, laser pulse width, and incident laser fluence. Edge velocity results are compared to a model of total transmitted fluence incident at the substrate/film interface. A model including laser-induced avalanche ionization and multiphoton ionization mechanisms in the substrate shows a transmitted fluence limit which is consistent with observed edge velocity limits. (C) 1999 American Institute of Physics. [S0021-8979(98)01824- 6].

引用

页码：460 / 465

页数：6

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