High efficiency-carrier-generation for the oxygen release reaction in indium tin oxide

被引:15
作者
Omata, T
Fujiwara, H
Otsuka-Yao-Matsuo, S
Ono, N
Ikawa, H
机构
[1] Osaka Univ, Grad Sch Engn, Dept Mat Sci & Proc, Suita, Osaka 5650871, Japan
[2] Mitsui Min & Smelting Co Ltd, Elect Mat Sector, Omuta 8360003, Japan
[3] Kanagawa Inst Technol, Dept Appl Chem, Atsugi, Kanagawa 2430292, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1998年 / 37卷 / 7B期
关键词
indium tin oxide; electrical conductivity; conduction electron density; efficiency-carrier-generation; oxygen release;
D O I
10.1143/JJAP.37.L879
中图分类号
O59 [应用物理学];
学科分类号
摘要
Indium tin oxide (ITO) sinters were heated up to 1073 and 1273 K under the condition that P(O(2))/P* = 4.9 x 10(-4) (P*: atmospheric pressure), when P(O(2)) was approximately 50Pa, in a closed-system oxygen-gas analyzer, and the number of oxygen atoms released from ITO was quantitatively determined. The conduction electron densities were determined by Hall measurements at room temperature. It was shown that the release of one oxygen atom corresponded to the generation of two conduction electrons, i.e., the efficiency-carrier-generation for the oxygen release from the ITO was almost one. Based on the crystal structure of the ITO, the oxygen atom released was originally at the 16c site in the space group of Ia3 as an interstitial excess oxygen; O(i)".
引用
收藏
页码:L879 / L881
页数:3
相关论文
共 14 条
[1]   Ozone in reactive gas for producing tin-doped indium oxide films by DC reactive magnetron sputtering [J].
Alam, AHMZ ;
Sasaki, K ;
Hata, T .
THIN SOLID FILMS, 1996, 281 :209-212
[2]   AMORPHOUS INDIUM OXIDE [J].
BELLINGHAM, JR ;
PHILLIPS, WA ;
ADKINS, CJ .
THIN SOLID FILMS, 1991, 195 (1-2) :23-31
[3]   THE EFFECT OF ANNEALING ON THE OPTICAL-PROPERTIES OF INDIUM TIN OXIDE-FILMS [J].
DIETRICH, A ;
SCHMALZBAUER, K ;
HOFFMANN, H ;
SZCZYRBOWSKI, J .
THIN SOLID FILMS, 1984, 122 (01) :19-29
[4]   ELECTRON-MICROSCOPIC STUDY OF THE 3SNO2.2IN2O3 INTERMEDIATE COMPOUND [J].
ENOKI, H ;
ECHIGOYA, J .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1992, 132 (01) :K1-K5
[5]   EFFECT OF O2 PRESSURE DURING DEPOSITION ON PROPERTIES OF RF-SPUTTERED SN-DOPED IN2O3 FILMS [J].
FAN, JCC ;
BACHNER, FJ ;
FOLEY, GH .
APPLIED PHYSICS LETTERS, 1977, 31 (11) :773-775
[6]   ELECTRICAL-PROPERTIES AND DEFECT MODEL OF TIN-DOPED INDIUM OXIDE LAYERS [J].
FRANK, G ;
KOSTLIN, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 27 (04) :197-206
[7]  
HENRY NFM, 1952, INT TABLES XRAY CRYS, V1, P315
[8]   The effects of oxygen content on electrical and optical properties of indium tin oxide films fabricated by reactive sputtering [J].
Honda, S ;
Watamori, M ;
Oura, K .
THIN SOLID FILMS, 1996, 281 :206-208
[9]   DEFECT STRUCTURE IN SC2O3 DOPED WITH MGO [J].
MCDOWELL, DJ ;
SCHEIDECKER, RW ;
BERARD, MF .
JOURNAL OF SOLID STATE CHEMISTRY, 1978, 23 (3-4) :357-360
[10]   In-situ observation of the electrical conductivity upon release and uptake of oxygen in indium tin oxide sinter [J].
Omata, T ;
Fujiwara, H ;
Otsuka-Yao-Matsuo, S ;
Ono, N .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (3A) :868-871