Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements

被引：30

作者：

Schulz-Ruhtenberg, M

Ihlemann, J

Heber, J

机构：

[1] Laser Lab Gottingen eV, D-37077 Gottingen, Germany

[2] Fraunhofer Inst Opt & Feinmech, D-07745 Jena, Germany

来源：

APPLIED SURFACE SCIENCE | 2005年 / 248卷 / 1-4期

关键词：

laser ablation; diffractive phase elements; SiOx; SiO2; UV-laser;

D O I：

10.1016/j.apsusc.2005.03.096

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Diffractive phase elements (DPE), consisting of a patterned UV-transparent layer on a UV-transparent substrate, were fabricated by three steps. A UV-absorbing SiOx-coating (x < 2) with a thickness matching to the required phase delay was deposited on a fused silica substrate. The coating was removed on a pixel array corresponding to a calculated two-dimensional quantized phase function (DPE-design). By a thermal annealing process the SiOx-coating was oxidised to UV-transparent SiO2, resulting in a UV-grade surface relief element. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：190 / 195

页数：6

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