Design of Patterned Surfaces with Selective Wetting Using Nanoimprint Lithography

被引:12
作者
Bessonov, Aleksander [1 ]
Kim, Jeong-Gil [1 ]
Seo, Jung-Woo [1 ]
Lee, Jong-Woo [1 ]
Lee, Sukwon [1 ]
机构
[1] Samsung Elect, Mech & Mfg Technol Ctr, Suwon 443742, Gyeonggi Do, South Korea
关键词
controlled wettability; lithography; nanoimprinting; nanotechnology; superhydrophobic surface; ANODIC ALUMINUM-OXIDE; REPLICATION; FABRICATION; DROPLETS;
D O I
10.1002/macp.201000483
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The fabrication of flexible surfaces with a combination of ultrahydrophobic and hydrophilic properties at alternating locations by UV NIL is reported. A new method for master fabrication based on nanoimprinting combined with photolithography is described. The master is used for a double replica technique to imprint nanopillars atop microstripes on a plastic substrate. Selective wetting is achieved due to ultrahydrophobic nanopatterned regions with 126 degrees WCA and hydrophilic flat regions with 708 WCA on a single surface. By covering surface with hydrophobic SAM, a static contact angle of nanopillars is increased up to 1638 indicating superhydrophobicity. We also show that the Cassie-Wenzel theory successfully predicts the experimental apparent contact angles.
引用
收藏
页码:2636 / 2641
页数:6
相关论文
共 25 条
[1]   Imprinted large-scale high density polymer nanopillars for organic solar cells [J].
Aryal, Mukti ;
Buyukserin, Fatih ;
Mielczarek, Kamil ;
Zhao, Xiao-Mei ;
Gao, Jinming ;
Zakhidov, Anvar ;
Hu, Wenchuang .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2008, 26 (06) :2562-2566
[2]   Biomimetic hierarchical structure for self-cleaning [J].
Bhushan, Bharat ;
Koch, Kerstin ;
Jung, Yong Chae .
APPLIED PHYSICS LETTERS, 2008, 93 (09)
[3]  
Chen L, 2009, NANOTECH CONFERENCE & EXPO 2009, VOL 3, TECHNICAL PROCEEDINGS, P194
[4]   A combined-nanoimprint-and-photolithography patterning technique [J].
Cheng, X ;
Guo, LJ .
MICROELECTRONIC ENGINEERING, 2004, 71 (3-4) :277-282
[5]   Development of large area nano imprint technology by step and repeat process and pattern stitching technique [J].
Cho, Youngtae ;
Kwon, Sin ;
Seo, Jung-Woo ;
Kim, Jeong-Gil ;
Cho, Jung-Woo ;
Park, Jung-Woo ;
Kim, Hyuk ;
Lee, Sukwon .
MICROELECTRONIC ENGINEERING, 2009, 86 (12) :2417-2422
[6]   Preparation and Characterisation of Super-Hydrophobic Surfaces [J].
Crick, Colin R. ;
Parkin, Ivan P. .
CHEMISTRY-A EUROPEAN JOURNAL, 2010, 16 (12) :3568-3588
[7]   Design and creation of superwetting/antiwetting surfaces [J].
Feng, Xinjian ;
Jiang, Lei .
ADVANCED MATERIALS, 2006, 18 (23) :3063-3078
[8]   Wetting and self-cleaning properties of artificial superhydrophobic surfaces [J].
Fürstner, R ;
Barthlott, W ;
Neinhuis, C ;
Walzel, P .
LANGMUIR, 2005, 21 (03) :956-961
[9]   Liquid morphologies on structured surfaces: From microchannels to microchips [J].
Gau, H ;
Herminghaus, S ;
Lenz, P ;
Lipowsky, R .
SCIENCE, 1999, 283 (5398) :46-49
[10]   Large-area fabrication of a nanostructure-induced hydrophobic surface from a hydrophilic polymer [J].
Guo, CW ;
Feng, L ;
Zhai, J ;
Wang, GJ ;
Song, YL ;
Jiang, L ;
Zhu, DB .
CHEMPHYSCHEM, 2004, 5 (05) :750-753