Excimer laser induced crystallization of amorphous hydrogenated carbon-germanium films fabricated by plasma CVD

被引:10
作者
Tyczkowski, J
Kazimierski, P
Hatanaka, Y
Aoki, I
机构
[1] Tech Univ Lodz, Fac Proc & Environm Engn, PL-93005 Lodz, Poland
[2] Aichi Univ Technol, Aichi 4430047, Japan
[3] Shizuoka Univ, Elect Res Inst, Hamamatsu, Shizuoka 432, Japan
关键词
plasma CVD; excimer laser crystallization; electrical conductivity; electron diffraction; Raman spectroscopy; hydrogenated carbon-germanium films;
D O I
10.1016/j.surfcoat.2005.01.020
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Excimer laser irradiation was demonstrated to be effective for the crystallization of the semiconducting form (a-S) of amorphous hydrogenated carbon-germanium (a-GexCy:H) films in contrast to the insulating form (a-I) of these films that were resistant to such a treatment. Electrical conductivity, electron diffraction and Raman spectroscopy were used to characterize non-treated and laser beam treated a-S films. Two separate nanocrystalline phases, germanium and graphite-like, were found in these films after the excimer laser crystallization (ELC). A drastic change in the electrical conductivity mechanism from temperature activated to almost temperature independent was also observed. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:222 / 226
页数:5
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