Experimental test of models of high-plasma-density, radio-frequency sheaths

被引:51
作者
Sobolewski, MA [1 ]
机构
[1] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
来源
PHYSICAL REVIEW E | 1999年 / 59卷 / 01期
关键词
D O I
10.1103/PhysRevE.59.1059
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Measurements of the rf-bias current and voltage applied to the substrate electrode of a high-density plasma reactor, combined with de measurements of the ion current at the electrode and capacitive probe measurements of the plasma potential, enabled a rigorous, quantitative test of models of the electrical properties of the sheath adjacent to the electrode. The measurements were performed for argon discharges at 1.33 Pa (10 mTorr), ion current densities of 1.3-13 mA/cm(2), rf-bias frequencies of 0.1-10 MHz, and rf-bias voltages from less than I to more than 100 V. From the measurements, the current, voltage, impedance, and power of the sheath adjacent to the electrode were determined and were compared to model predictions. The properties of the opposing sheath, adjacent to grounded surfaces, were also determined. The behavior of the two sheaths ranged from nearly symmetric to very asymmetric. Changes in the symmetry are explained by models of the sheath impedance. [S1063-651X(99)03501-1].
引用
收藏
页码:1059 / 1072
页数:14
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