THE PLASMA-ETCHING OF POLYSILICON WITH CF3CL/ARGON DISCHARGES .2. MODELING OF ION-BOMBARDMENT ENERGY-DISTRIBUTIONS

被引：18

作者：

ALLEN, KD ^{[1
]}

SAWIN, HH ^{[1
]}

机构：

[1] MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139

来源：

关键词：

D O I：

10.1149/1.2108401

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2326 / 2331

页数：6

共 17 条

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[8] JENKINS MW, 1986, SOLID STATE TECHNOL, V29, P175
[9] APPLICATION OF RF DISCHARGES TO SPUTTERING
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