Graphene;
bilayer;
chemical vapor deposition;
wafer scale;
band gap opening;
SINGLE-LAYER;
TRANSISTORS;
BANDGAP;
D O I:
10.1021/nl1029978
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
The discovery of electric field induced band gap opening in bilayer graphene opens a new door for making semiconducting graphene without aggressive size scaling or using expensive substrates. However, bilayer graphene samples have been limited to mu m(2) size scale thus far, and synthesis of wafer scale bilayer graphene poses a tremendous challenge. Here we report homogeneous bilayer graphene films over at least a 2 in. x 2 in. area, synthesized by chemical vapor deposition on copper foil and subsequently transferred to arbitrary substrates. The bilayer nature of graphene film is verified by Raman spectroscopy, atomic force microscopy, and transmission electron microscopy. Importantly, spatially resolved Raman spectroscopy confirms a bilayer coverage of over 99%. The homogeneity of the film is further supported by electrical transport measurements on dual-gate bilayer graphene transistors, in which a band gap opening is observed in 98% of the devices.
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Elect Engn, New York, NY 10027 USA
Columbia Univ, Dept Chem, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Berciaud, Stephane
;
Ryu, Sunmin
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Chem, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Ryu, Sunmin
;
Brus, Louis E.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Chem, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Brus, Louis E.
;
Heinz, Tony F.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Elect Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
;
Novoselov, K. S.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Elect Engn, New York, NY 10027 USA
Columbia Univ, Dept Chem, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Berciaud, Stephane
;
Ryu, Sunmin
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Chem, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Ryu, Sunmin
;
Brus, Louis E.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Chem, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Brus, Louis E.
;
Heinz, Tony F.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Elect Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
;
Novoselov, K. S.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England