Residual stress and microhardness of DLC multilayer coatings

被引:53
作者
Deng, JG
Braun, M
机构
关键词
DLC; sputtering; residual stress; microhardness; multilayer coatings;
D O I
10.1016/0925-9635(96)80063-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The residual stress and microhardness of diamond-like carbon (DLC) multilayer coatings (about 2.5 mu m thick), prepared by unbalanced magnetron sputtering with various methane gas flow rates, substrate bias voltages and substrate bias ion current densities, have been measured. The experimental results show that the residual stress value is strongly affected by the substrate bias voltage and ion current density. The residual stress value increases with substrate bias voltage, reaches a maximum of 8.5 GPa at a bias of -150 V, and then decreases slightly. However, at a constant bias voltage of -80 V, the residual stress increases with bias ion current density in the range studied here, and reaches a maximum of 8.0 GPa at a bias ion current density of 3.0 mA cm(-2). Furthermore, a close correlation between microhardness and residual stress is observed. Increasing the methane gas flow rate to a certain value leads to higher residual stresses and microhardnesses. However, a further increase in the gas flow rate has no obvious effect.
引用
收藏
页码:478 / 482
页数:5
相关论文
共 16 条
[1]  
CHEN YI, 1991, SURF COAT TECH, V47, P371
[2]   STRESS EFFECTS IN BORON-IMPLANTED POLYSILICON FILMS [J].
CHOI, MS ;
HEARN, EW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (10) :2443-2446
[3]   DLC MULTILAYER COATINGS FOR WEAR PROTECTION [J].
DENG, JG ;
BRAUN, M .
DIAMOND AND RELATED MATERIALS, 1995, 4 (07) :936-943
[4]   TRIBOLOGICAL AND ELECTRICAL-PROPERTIES OF METAL-CONTAINING HYDROGENATED CARBON-FILMS [J].
DIMIGEN, H ;
HUBSCH, H ;
MEMMING, R .
APPLIED PHYSICS LETTERS, 1987, 50 (16) :1056-1058
[5]  
Dimigen H., 1983, Philips Technical Review, V41, P186
[6]   FRICTIONAL-PROPERTIES OF DIAMOND-LIKE CARBON LAYERS [J].
ENKE, K ;
DIMIGEN, H ;
HUBSCH, H .
APPLIED PHYSICS LETTERS, 1980, 36 (04) :291-292
[7]   STRESSES DEVELOPED IN OPTICAL FILM COATINGS [J].
ENNOS, AE .
APPLIED OPTICS, 1966, 5 (01) :51-&
[8]   TI(C,N) COATINGS USING THE ARC PROCESS [J].
ERTURK, E ;
KNOTEK, O ;
BURGMER, W ;
PRENGEL, HG ;
HEUVEL, HJ ;
DEDERICHS, HG ;
STOSSEL, C .
SURFACE & COATINGS TECHNOLOGY, 1991, 46 (01) :39-46
[9]  
GHATE PB, 1974, J ELECTROCHEM SOC, V119, P491
[10]   STRESS IN POLYCRYSTALLINE AND AMORPHOUS-SILICON THIN-FILMS [J].
HOWE, RT ;
MULLER, RS .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4674-4675