Surface potential measurements on GaN and AlGaN/GaN heterostructures by scanning Kelvin probe microscopy

被引:130
作者
Koley, G [1 ]
Spencer, MG [1 ]
机构
[1] Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA
关键词
D O I
10.1063/1.1371941
中图分类号
O59 [应用物理学];
学科分类号
摘要
Surface potentials on GaN epilayers and Al0.35Ga0.65N/GaN heterostructures have been studied by scanning Kelvin probe microscopy (SKPM) in conjunction with noncontact atomic force microscopy. The dependence of the surface potential on doping in GaN films, as well as the variation of surface potential with Al0.35Ga0.65N barrier layer thickness has been investigated. The bare surface barrier height (BSBH), as measured by SKPM, is observed to decrease from similar to1. 40 +/-0.1 eV to similar to0.60 +/-0.1 eV with increasing doping in the GaN epilayers. Schottky barrier height calculated from the measurements of BSBH on n-GaN agrees very well with results from previous studies. We have also estimated the surface state density for GaN based on the measured values of BSBH. The semiconductor "work function" at the Al0.35Ga0.65N surface (in heterostructure samples) is observed to decrease by similar to0.60 eV with increase in barrier layer thickness from similar to 50 to similar to 440 A. A simple model considering the presence of a uniform density of charged acceptors in the Al0.35Ga0.65N layer is proposed to explain the observed decreasing trend in work function. (C) 2001 American Institute of Physics.
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页码:337 / 344
页数:8
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