Spontaneous formation of patterns on sputtered surfaces

被引:29
作者
Chason, E
Aziz, MJ
机构
[1] Brown Univ, Div Engn, Providence, RI 02912 USA
[2] Harvard Univ, Div Engn & Appl Sci, Cambridge, MA 02138 USA
关键词
self-organization and patterning; surface structure; ion beam processing; sputtering;
D O I
10.1016/S1359-6462(03)00474-3
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Sputtering by collimated low energy ion beams can spontaneously create periodic structures on many surfaces. The pattern results from the balance between roughening by atom removal and smoothing, typically by surface diffusion. Experiments on a number of surfaces are considered in terms of linear and non-linear models of surface evolution. (C) 2003 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:953 / 959
页数:7
相关论文
共 33 条
[1]   THEORY OF RIPPLE TOPOGRAPHY INDUCED BY ION-BOMBARDMENT [J].
BRADLEY, RM ;
HARPER, JME .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04) :2390-2395
[2]  
CHAN WL, UNPUB
[3]  
CUENAT A, 2002, MRS S P, V696
[4]   DYNAMIC SCALING OF ION-SPUTTERED SURFACES [J].
CUERNO, R ;
BARABASI, AL .
PHYSICAL REVIEW LETTERS, 1995, 74 (23) :4746-4749
[5]   Comment on "Nonclassical smoothening of nanoscale surface corrugations" - Reply [J].
Erlebacher, J ;
Aziz, MJ ;
Chason, E ;
Sinclair, MB ;
Floro, JA .
PHYSICAL REVIEW LETTERS, 2002, 88 (16)
[6]   Spontaneous pattern formation on ion bombarded Si(001) [J].
Erlebacher, J ;
Aziz, MJ ;
Chason, E ;
Sinclair, MB ;
Floro, JA .
PHYSICAL REVIEW LETTERS, 1999, 82 (11) :2330-2333
[7]   Nonlinear amplitude evolution during spontaneous patterning of ion-bombarded Si(001) [J].
Erlebacher, J ;
Aziz, MJ ;
Chason, E ;
Sinclair, MB ;
Floro, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (01) :115-120
[8]   Nonclassical smoothening of nanoscale surface corrugations [J].
Erlebacher, J ;
Aziz, MJ ;
Chason, E ;
Sinclair, MB ;
Floro, JA .
PHYSICAL REVIEW LETTERS, 2000, 84 (25) :5800-5803
[9]   Formation of ordered nanoscale semiconductor dots by ion sputtering [J].
Facsko, S ;
Dekorsy, T ;
Koerdt, C ;
Trappe, C ;
Kurz, H ;
Vogt, A ;
Hartnagel, HL .
SCIENCE, 1999, 285 (5433) :1551-1553
[10]   The role of sample rotation and oblique ion incidence on quantum-dot formation by ion sputtering [J].
Frost, R .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2002, 74 (01) :131-133