1/f noise as an early indicator of electromigration damage in thin metal films

被引：38

作者：

Dagge, K ^{[1
]}

Frank, W ^{[1
]}

Seeger, A ^{[1
]}

Stoll, H ^{[1
]}

机构：

[1] UNIV STUTTGART,INST THEORET & ANGEW PHYS,D-70569 STUTTGART,GERMANY

来源：

APPLIED PHYSICS LETTERS | 1996年 / 68卷 / 09期

关键词：

D O I：

10.1063/1.115967

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electromigration in thin films of aluminium and aluminium alloys is shown to lead to stepwise increases of the electrical 1/f noise. These are attributed to the generation of highly mobile defect configurations by a nucleation-and-growth process. It is conjectured that among them may be the defects that are responsible for the eventual failure of VLSI electronic devices by electromigration damage. 1/f noise promises to be an early indicator of this damage. (C) 1996 American Institute of Physics.

引用

页码：1198 / 1200

页数：3

共 7 条

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