RF sputtering deposition of Ag/ITO coatings at room temperature

被引:69
作者
Bertran, E [1 ]
Corbella, C [1 ]
Vives, M [1 ]
Pinyol, A [1 ]
Person, C [1 ]
Porqueras, I [1 ]
机构
[1] Univ Barcelona, Dept Fis Aplicada & Opt, FEMAN, E-08028 Barcelona, Spain
关键词
thin films; ITO; Ag; PVD; polymeric substrate indium tin oxide; TCO; e-beam; Rf magnetron sputtering; electrochromism;
D O I
10.1016/j.ssi.2003.08.055
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Indium tin oxide (ITO) thin films were deposited on unheated polyester and glass substrates by RF sputtering from ceramic ITO and metal targets. ITO films deposited on polyester substrates showed resistivities of 6 x 10(-6) Omega(.)m and square resistances of 16 Omega/square as well as optical transmittances of 70%. Highest conductivities were achieved using low Ar pressures of 0.4 Pa (without oxygen), and high power densities of 2 x 10(4) Wm(-2). Glass and polyester substrates exhibited different growth rates and samples deposited onto glass substrates showed better adhesion of the film. The addition of silver layers in the ITO films resulted in lowering their electrical resistivity with a slight reduction of their optical transmittance. These films have been produced using a simple sputtering system at room temperature and can be deposited homogeneously on large area elastic substrates with square resistances (R-square) on the order of 20 Omega/square. Electrical and optical properties of ITO samples have been studied by electrical, Hall mobility and optical transmittance (UV-visible range) measurements. The results are discussed in terms of their application as transparent electrodes in large area electrochromic devices. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:139 / 148
页数:10
相关论文
共 10 条
[1]   Dependence of film composition and thicknesses on optical and electrical properties of ITO-metal-ITO multilayers [J].
Bender, M ;
Seelig, W ;
Daube, C ;
Frankenberger, H ;
Ocker, B ;
Stollenwerk, J .
THIN SOLID FILMS, 1998, 326 (1-2) :67-71
[2]   Deposition of transparent and conducting indium-tin-oxide films by the r.f.-superimposed DC sputtering technology [J].
Bender, M ;
Trube, J ;
Stollenwerk, J .
THIN SOLID FILMS, 1999, 354 (1-2) :100-105
[3]   Fabrication and characterization of ITO thin films deposited by excimer laser evaporation [J].
Coutal, C ;
Azema, A ;
Roustan, JC .
THIN SOLID FILMS, 1996, 288 (1-2) :248-253
[4]   INDIUM-TIN OXIDE THIN-FILMS BY METAL-ORGANIC DECOMPOSITION [J].
GALLAGHER, D ;
SCANLAN, F ;
HOURIET, R ;
MATHIEU, HJ ;
RING, TA .
JOURNAL OF MATERIALS RESEARCH, 1993, 8 (12) :3135-3144
[5]  
HAACKE G, 1973, J APPL PHYS, V44, P4618
[6]   Electrical and optical properties of sputter deposited tin doped indium oxide thin films with silver additive [J].
Hultåker, A ;
Järrendahl, K ;
Lu, J ;
Granqvist, CG ;
Niklasson, GA .
THIN SOLID FILMS, 2001, 392 (02) :305-310
[7]   Estimation and verification of the optical properties of indium tin oxide based on the energy band diagram [J].
Knickerbocker, SA ;
Kulkarni, AK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (03) :757-761
[8]   LOW-RESISTIVITY AND HIGH-MOBILITY TIN-DOPED INDIUM OXIDE-FILMS [J].
RAUF, IA .
MATERIALS LETTERS, 1993, 18 (03) :123-127
[9]  
Tahar RBH, 1998, J APPL PHYS, V83, P2631, DOI 10.1063/1.367025
[10]   Accurate and rapid determination of thickness, n and k spectra, and resistivity of indium-tin-oxide films [J].
Zhang, K ;
Forouhi, AR ;
Bloomer, I .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (04) :1843-1847