Blue and red photoluminescence from Ge+ implanted SiO2 films and its multiple mechanism

被引:45
作者
Zhang, JY [1 ]
Bao, XM
Ye, YH
Tan, XL
机构
[1] Nanjing Univ, Dept Phys, Nanjing 210093, Peoples R China
[2] Nanjing Normal Univ, Dept Phys, Nanjing 210097, Peoples R China
关键词
D O I
10.1063/1.122283
中图分类号
O59 [应用物理学];
学科分类号
摘要
Under violet excitation, a strong blue band and a broad red band are emitted simultaneously from the Ge nanocrystal embedded SiO2 films fabricated by Ge+ implantation and annealing. The blue band exhibits a complex annealing behavior, and the photoluminescence excitation spectral analysis indicates that it results from a combination of several implantation-induced deficient centers. The peak position of the red band shifts from 600 to 640 nm when the mean size of Ge nanocrystals increases from 4.3 to 6.7 nm, suggesting that the red band comes from the radiative recombination of excitons confined in Ge nanocrystals. (C) 1998 American Institute of Physics. [S0003-6951(98)02739-9].
引用
收藏
页码:1790 / 1792
页数:3
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