Fabrication of double-length-scale patterns via lithography, block copolymer templating, and Electrodeposition

被引：32

作者：

Tseng, Yu-Tsan

Tseng, Wen-Hsien

Lin, Cheng-Hsuan

Ho, Rong-Ming ^{[1
]}

机构：

[1] Natl Tsing Hua Univ, Dept Chem Engn, Hsinchu 30013, Taiwan

[2] Ind Technol Res Inst, Mat Chem Res Labs, Hsinchu 30013, Taiwan

[3] Natl Tsing Hua Univ, Dept Chem Engn, Hsinchu 30013, Taiwan

来源：

ADVANCED MATERIALS | 2007年 / 19卷 / 21期

关键词：

D O I：

10.1002/adma.200700042

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A straightforward and effective method for the fabrication of double-length-scale patterned (i.e., composite micro- and nanopatterned) carbon nanotube (CNT) arrays can be achieved by block copolymer templating on a prepatterned conducting substrate followed by electroplating to deposit Ni (see figure). Significant improvement in the current density with low threshold voltage and high field-emission efficiency can be found in the composite micro- and nanopatterns of CNT arrays.

引用

收藏

页码：3584 / +

页数：6

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