Mn interstitial diffusion in (Ga,Mn)As

被引:463
作者
Edmonds, KW [1 ]
Boguslawski, P
Wang, KY
Campion, RP
Novikov, SN
Farley, NRS
Gallagher, BL
Foxon, CT
Sawicki, M
Dietl, T
Nardelli, MB
Bernholc, J
机构
[1] Univ Nottingham, Sch Phys & Astron, Nottingham NG7 2RD, England
[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
[3] Japan Sci & Technol Corp, ERATO, Semicond Spintron Project, PL-02668 Warsaw, Poland
[4] N Carolina State Univ, Dept Phys, Raleigh, NC 27695 USA
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1103/PhysRevLett.92.037201
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We present a combined theoretical and experimental study of the ferromagnetic semiconductor (Ga,Mn)As which explains the remarkably large changes observed on low-temperature annealing. Careful control of the annealing conditions allows us to obtain samples with ferromagnetic transition temperatures up to 159 K. Ab initio calculations, in situ Auger spectroscopy, and resistivity measurements during annealing show that the observed changes are due to out diffusion of Mn interstitials towards the surface, governed by an energy barrier of 0.7-0.8 eV. Electric fields induced by Mn acceptors have a significant effect on the diffusion.
引用
收藏
页数:4
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